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Original Research 
RMJ. 2019; 44(4): 744-747


The Intensity of Extremely Low Frequency Electromagnetic Field by Distance and Brightness of Luxtec® Light Source device

Hyun Ji Jo, Jae Hwan Kim, Sang Eun Lee, Yei Heum Park, Hyunseong Lee, Yong Han Kim.

Abstract
Objective: Extremely low frequency electromagnetic field (ELF-EMF) is known to have harmful effects on the human body. Luxtec® light source device, which is effective medical equipment for vision during surgery, also produce ELF-EMF. The intensity of ELF-EMF according to the distance and brightness of Luxtec® light source device was measured and the change in the intensity of ELF-EMF was analyzed.
Methodology: In this prospective experimental study, the intensity of ELF-EMF was measured on various distance (15, 30, 45 cm) and brightness (off, 1, 2, 3 level) from Luxtec® light source device. ELF-EMF was measured 180 times for 6 minutes at interval of 2 seconds. The Kruskal-Wallis test was applied to each group to give statistical significance at p value <0.05.
Results: Mean value of ELF-EMF was 2.0823, 2.0886, and 2.1855 mG, respectively on the 1, 2, and 3 level of brightness at the distance of 30 cm from the Luxtec® light source device. The lower brightness, the lower the intensity of ELF-EMF was measured. The 3 level of brightness showed the higher intensity of ELF-EMF at all distances (p <0.05).
Conclusion: The intensity of ELF-EMF from Luxtec® light source device is higher in condition of closer distance and higher level of brightness. The intensity of ELF-EMF in the distance of 30 cm exceeded Swedish TCO guideline than is under 2 mG.

Key words: ELF-EMF, light source device, operating room.


 
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How to Cite this Article
Pubmed Style

Jo HJ, Kim JH, Lee SE, Park YH, Lee H, Kim YH. The Intensity of Extremely Low Frequency Electromagnetic Field by Distance and Brightness of Luxtec® Light Source device. RMJ. 2019; 44(4): 744-747.


Web Style

Jo HJ, Kim JH, Lee SE, Park YH, Lee H, Kim YH. The Intensity of Extremely Low Frequency Electromagnetic Field by Distance and Brightness of Luxtec® Light Source device. http://www.rmj.org.pk/?mno=64471 [Access: March 28, 2020].


AMA (American Medical Association) Style

Jo HJ, Kim JH, Lee SE, Park YH, Lee H, Kim YH. The Intensity of Extremely Low Frequency Electromagnetic Field by Distance and Brightness of Luxtec® Light Source device. RMJ. 2019; 44(4): 744-747.



Vancouver/ICMJE Style

Jo HJ, Kim JH, Lee SE, Park YH, Lee H, Kim YH. The Intensity of Extremely Low Frequency Electromagnetic Field by Distance and Brightness of Luxtec® Light Source device. RMJ. (2019), [cited March 28, 2020]; 44(4): 744-747.



Harvard Style

Jo, H. J., Kim, . J. H., Lee, . S. E., Park, . Y. H., Lee, . H. & Kim, . Y. H. (2019) The Intensity of Extremely Low Frequency Electromagnetic Field by Distance and Brightness of Luxtec® Light Source device. RMJ, 44 (4), 744-747.



Turabian Style

Jo, Hyun Ji, Jae Hwan Kim, Sang Eun Lee, Yei Heum Park, Hyunseong Lee, and Yong Han Kim. 2019. The Intensity of Extremely Low Frequency Electromagnetic Field by Distance and Brightness of Luxtec® Light Source device. Rawal Medical Journal, 44 (4), 744-747.



Chicago Style

Jo, Hyun Ji, Jae Hwan Kim, Sang Eun Lee, Yei Heum Park, Hyunseong Lee, and Yong Han Kim. "The Intensity of Extremely Low Frequency Electromagnetic Field by Distance and Brightness of Luxtec® Light Source device." Rawal Medical Journal 44 (2019), 744-747.



MLA (The Modern Language Association) Style

Jo, Hyun Ji, Jae Hwan Kim, Sang Eun Lee, Yei Heum Park, Hyunseong Lee, and Yong Han Kim. "The Intensity of Extremely Low Frequency Electromagnetic Field by Distance and Brightness of Luxtec® Light Source device." Rawal Medical Journal 44.4 (2019), 744-747. Print.



APA (American Psychological Association) Style

Jo, H. J., Kim, . J. H., Lee, . S. E., Park, . Y. H., Lee, . H. & Kim, . Y. H. (2019) The Intensity of Extremely Low Frequency Electromagnetic Field by Distance and Brightness of Luxtec® Light Source device. Rawal Medical Journal, 44 (4), 744-747.








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